August 9, 2011   
Concurrent Collaboration Ensures Optimized IP Development at the Leading Edge
Walter Ng
There is no question that IC manufacturing processes are becoming both more capable and complex at the same time. The path from 45nm to 32nm to 28nm and 22/20nm is a significant enabler for more innovation and more highly integrated SoCs. These platforms are capable of integrating hundreds of discrete functions and saving untold millions of dollars in development time and resources. Design reuse and IP integration has reached a whole new level thanks to the capacity of these advanced manufacturing geometries.

Of course, with this steady advancement comes a need to change the way design and design enablement has traditionally worked. Some of the changes are obvious to designers, who must move to new design tools and methodologies to deal with the inherent complexities of these nodes, as well as understand the impact of the new physics and even materials introduced at these technology nodes.
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True Circuits has been the leader in timing IP technology development and delivery since 1998. TCI offers the industry's largest portfolio of low-jitter, silicon proven, general purpose and high performance PLLs and DLLs for a wide range of applications, frequencies, sizes, and price points in TSMC, GLOBALFOUNDRIES and UMC processes from 180nm to 28nm. Visit the timing experts today. Click here now! more >>
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